Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes
Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl–Cu2O) on rGO electrodes. The structure and properties of the deposited Cl–Cu2O hav...
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| Main Authors: | , , , , , |
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| 其他作者: | |
| 格式: | Article |
| 語言: | English |
| 出版: |
2012
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| 主題: | |
| 在線閱讀: | https://hdl.handle.net/10356/94380 http://hdl.handle.net/10220/8390 |
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| 總結: | Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various
semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type
Cu2O (Cl–Cu2O) on rGO electrodes. The structure and properties of the deposited Cl–Cu2O have been
investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and
photocurrent of Cl–Cu2O has also been investigated. Our study shows significant implications in
tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods. |
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