Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes

Electrochemical deposition of Cl-doped n-type Cu2O on reduced graphene oxide electrodes

Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl–Cu2O) on rGO electrodes. The structure and properties of the deposited Cl–Cu2O hav...

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Bibliographic Details
Main Authors: Wu, Shixin, Yin, Zongyou, He, Qiyuan, Lu, Gang, Zhou, Xiaozhu, Zhang, Hua
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
Subjects:
DRNTU::Engineering::Materials
Online Access:https://hdl.handle.net/10356/94380
http://hdl.handle.net/10220/8390
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Institution: Nanyang Technological University
Language: English
Description
Summary:Reduced graphene oxide (rGO) electrodes can be applied for the electrochemical deposition of various semiconductor oxides. In this study, we demonstrate the electrochemical deposition of Cl-doped n-type Cu2O (Cl–Cu2O) on rGO electrodes. The structure and properties of the deposited Cl–Cu2O have been investigated extensively. Moreover, the effect of Cl doping on the carrier concentration and photocurrent of Cl–Cu2O has also been investigated. Our study shows significant implications in tailoring the properties of materials deposited on rGO electrodes by using electrochemical methods.

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