Growth of large-sized graphene thin-films by liquid precursor-based chemical vapor deposition under atmospheric pressure

• Main Authors: Dong, Xiaochen, Peng, Wang, Fang, Wenjing, Su, Ching-Yuan, Chen, Yu-Hsin, Li, Lain-Jong, Huang, Wei, Chen, Peng
• Other Authors: School of Chemical and Biomedical Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/94435; http://hdl.handle.net/10220/7501
• Institution: Nanyang Technological University

Large-sized thin-films composed of single- and few-layered graphene have been synthesized by chemical vapor deposition (CVD) on copper foils under atmospheric pressure using ethanol or pentane as the precursor. Confocal Raman measurements, transmission electron microscopy and scanning tunneling microscopy show that the majority part of the obtained films exhibit hexagonal graphene lattice. Optical microscopy and electrical measurements confirm the continuity of these films. It is also found that the CVD-grown graphene films with ethanol as the precursor exhibit lower defect density, higher electrical conductivity, and higher hall mobility than those grown with pentane as the precursor. This liquid-precursor-based atmospheric pressure CVD synthesis provides a new route for simple, inexpensive and safe growth of graphene thin-films.