Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates

Laser-induced melt-mediated Ni-based germanosilicide has been formed on condensed SiGe substrates (with 40% Ge). Pure Ni germanosilicide formation was plagued by the presence of amorphous oxygen-rich globules. Platinum alloying has greatly improved the morphology of the...

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Main Authors: Setiawan, Y., Lee, Pooi See, Balakumar, S., Pey, Kin Leong, Wang, X. C.
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2012
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Online Access:https://hdl.handle.net/10356/95002
http://hdl.handle.net/10220/8005
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-950022023-07-14T15:44:48Z Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates Setiawan, Y. Lee, Pooi See Balakumar, S. Pey, Kin Leong Wang, X. C. School of Materials Science & Engineering DRNTU::Engineering::Materials Laser-induced melt-mediated Ni-based germanosilicide has been formed on condensed SiGe substrates (with 40% Ge). Pure Ni germanosilicide formation was plagued by the presence of amorphous oxygen-rich globules. Platinum alloying has greatly improved the morphology of the laser-induced Ni(Pt) germanosilicide with the alleviation of oxygen incorporation during laser annealing. This results in an improvement in the surface roughness and electrical conductivity of the germanosilicide film. Low affinity of Pt toward oxygen is believed to have resulted in this improvement. Published version 2012-05-16T03:49:01Z 2019-12-06T19:06:15Z 2012-05-16T03:49:01Z 2019-12-06T19:06:15Z 2008 2008 Journal Article Setiawan, Y., Lee, P. S., Balakumar, S., Pey, K. L., & Wang, X. C. (2008). Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates. Electrochemical and Solid-State Letters, 11(9). https://hdl.handle.net/10356/95002 http://hdl.handle.net/10220/8005 10.1149/1.2953682 en Electrochemical and solid-state letters © 2008 The Electrochemical Society. This paper was published in Electrochemical and Solid-State Letters and is made available as an electronic reprint (preprint) with permission of The Electrochemical Society. The paper can be found at the following official URL: http://dx.doi.org/10.1149/1.2953682. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. 4 p. application/pdf
institution Nanyang Technological University
building NTU Library
continent Asia
country Singapore
Singapore
content_provider NTU Library
collection DR-NTU
language English
topic DRNTU::Engineering::Materials
spellingShingle DRNTU::Engineering::Materials
Setiawan, Y.
Lee, Pooi See
Balakumar, S.
Pey, Kin Leong
Wang, X. C.
Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
description Laser-induced melt-mediated Ni-based germanosilicide has been formed on condensed SiGe substrates (with 40% Ge). Pure Ni germanosilicide formation was plagued by the presence of amorphous oxygen-rich globules. Platinum alloying has greatly improved the morphology of the laser-induced Ni(Pt) germanosilicide with the alleviation of oxygen incorporation during laser annealing. This results in an improvement in the surface roughness and electrical conductivity of the germanosilicide film. Low affinity of Pt toward oxygen is believed to have resulted in this improvement.
author2 School of Materials Science & Engineering
author_facet School of Materials Science & Engineering
Setiawan, Y.
Lee, Pooi See
Balakumar, S.
Pey, Kin Leong
Wang, X. C.
format Article
author Setiawan, Y.
Lee, Pooi See
Balakumar, S.
Pey, Kin Leong
Wang, X. C.
author_sort Setiawan, Y.
title Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
title_short Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
title_full Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
title_fullStr Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
title_full_unstemmed Laser-induced melt-mediated Ni(Pt) germanosilicide formation on condensed Si1-xGex/Si substrates
title_sort laser-induced melt-mediated ni(pt) germanosilicide formation on condensed si1-xgex/si substrates
publishDate 2012
url https://hdl.handle.net/10356/95002
http://hdl.handle.net/10220/8005
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