On the morphological changes of Ni- and Ni(Pt)-silicides

• Main Authors: Mangelinck, D., Osipowicz, T., Lee, Pooi See, Pey, Kin Leong, Chi, Dong Zhi
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials
• Online Access: https://hdl.handle.net/10356/95016; http://hdl.handle.net/10220/8103
• Institution: Nanyang Technological University

The issue of agglomeration and layer inversion has remained critical because conductivity of thin silicide films is sensitive to the degradation of the film morphology. The purpose of this work is to study the morphology degradation that...