Immersion nickel deposition on blank silicon in aqueous solution containing ammonium fluoride

Immersion deposition of Ni on p-Si (100) blank substrates was carried out in an aqueous NiSO4 solution at a pH value of 8 through displacement reactions. Study of the early deposition stage revealed that incorporation of 2.5 M NH4F in solution promoted Ni nucleation significantly. By adding fluoride...

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Bibliographic Details
Main Authors: Tu, K. N., Zhang, Xi, Chen, Zhong
Other Authors: School of Materials Science & Engineering
Format: Article
Language:English
Published: 2013
Subjects:
Online Access:https://hdl.handle.net/10356/95789
http://hdl.handle.net/10220/9474
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Institution: Nanyang Technological University
Language: English