Large-scale quantification of CVD graphene surface coverage
The extraordinary properties demonstrated for graphene and graphene-related materials can be fully exploited when a large-scale fabrication procedure is made available. Chemical vapor deposition (CVD) of graphene on Cu and Ni substrates is one of the most promising procedures to synthesize large-a...
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Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Language: | English |
Published: |
2013
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Subjects: | |
Online Access: | https://hdl.handle.net/10356/96089 http://hdl.handle.net/10220/10047 |
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Institution: | Nanyang Technological University |
Language: | English |
Summary: | The extraordinary properties demonstrated for graphene and graphene-related materials can be fully
exploited when a large-scale fabrication procedure is made available. Chemical vapor deposition (CVD) of
graphene on Cu and Ni substrates is one of the most promising procedures to synthesize large-area and
good quality graphene films. Parallel to the fabrication process, a large-scale quality monitoring
technique is equally crucial. We demonstrate here a rapid and simple methodology that is able to probe
the effectiveness of the growth process over a large substrate area for both Ni and Cu substrates. This
method is based on inherent electrochemical signals generated by the underlying metal catalysts when
fractures or discontinuities of the graphene film are present. The method can be applied immediately
after the CVD growth process without the need for any graphene transfer step and represents a powerful
quality monitoring technique for the assessment of large-scale fabrication of graphene by the CVD process. |
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