Electrical properties of textured (KNa)0.44Li0.06Nb0.84Sb0.06Ta0.1O3 thick films

• المؤلفون الرئيسيون: Fu, Fang, Zhai, Jiwei, Xu, Zhengkui, Bai, Wangfeng, Kong, Ling Bing
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Materials::Electronic packaging materials
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/96563; http://hdl.handle.net/10220/18088

Lead-free (KNa)0.44Li0.06Nb0.84Sb0.06Ta0.1O3 textured thick films with 25 μm thickness were fabricated by the reactive templated grain growth method. The influence of LiSbO3 substitution on the degree of grain orientation was investigated. The addition of LiSbO3 improved the dielectric properties of...