Electrical properties of textured (KNa)0.44Li0.06Nb0.84Sb0.06Ta0.1O3 thick films

• Main Authors: Fu, Fang, Zhai, Jiwei, Xu, Zhengkui, Bai, Wangfeng, Kong, Ling Bing
• 其他作者: School of Materials Science & Engineering
• 格式: Article
• 語言: English
• 出版: 2013
• 主題: DRNTU::Engineering::Materials::Electronic packaging materials
• 在線閱讀: https://hdl.handle.net/10356/96563; http://hdl.handle.net/10220/18088

Lead-free (KNa)0.44Li0.06Nb0.84Sb0.06Ta0.1O3 textured thick films with 25 μm thickness were fabricated by the reactive templated grain growth method. The influence of LiSbO3 substitution on the degree of grain orientation was investigated. The addition of LiSbO3 improved the dielectric properties of...