Fabrication of graphene nanomesh by using an anodic aluminum oxide membrane as a template

• Main Authors: Zeng, Zhiyuan, Huang, Xiao, Yin, Zongyou, Li, Hong, Chen, Yang, Li, Hai, Zhang, Qing, Ma, Jan, Boey, Freddy Yin Chiang, Zhang, Hua
• Other Authors: School of Electrical and Electronic Engineering
• Format: Article
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/97087; http://hdl.handle.net/10220/10461
• Institution: Nanyang Technological University

Large-area graphene nanomesh (GNM) is prepared using a new and effective method, in which the O2 plasma treatment is used with an anodic aluminum oxide (AAO) membrane as an etch mask. By varying the pore size and cell wall thickness of the AAO membrane, GNM with tunable pore size and neck width can be prepared. As proof of concept, a field-effect transistor with 15 nm neck width GNM as the conductive channel is fabricated, which exhibits p-type semiconducting behavior.