Effect of sputtering process parameters on the thermoelectric properties of P and N-type Bi2Te3 films

• المؤلفون الرئيسيون: Arina, Fan, Shermin Chow Hui, Shamira, Banu Abdul Bari, Chia, Ai Lin, San, Ye Ko, Khong, Samuel, Sim, Jonathan, Ezhilvalavan, Santhiagu, Ma, Jan, Hoon, Heng Hui
• مؤلفون آخرون: School of Materials Science & Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/97690; http://hdl.handle.net/10220/13209
• المؤسسة: Nanyang Technological University

Thermoelectric is an ever evolving field that serves many critical needs (cooling and power generation) in the industry. The key objective of this work is to fabricate Bismuth Telluride (Bi2Te3) thin-films by varying the various process parameters using a radio-frequency (RF) magnetron sputtering di...