Effect of sputtering process parameters on the thermoelectric properties of P and N-type Bi2Te3 films

• Main Authors: Arina, Fan, Shermin Chow Hui, Shamira, Banu Abdul Bari, Chia, Ai Lin, San, Ye Ko, Khong, Samuel, Sim, Jonathan, Ezhilvalavan, Santhiagu, Ma, Jan, Hoon, Heng Hui
• 其他作者: School of Materials Science & Engineering
• 格式: Article
• 語言: English
• 出版: 2013
• 在線閱讀: https://hdl.handle.net/10356/97690; http://hdl.handle.net/10220/13209

Thermoelectric is an ever evolving field that serves many critical needs (cooling and power generation) in the industry. The key objective of this work is to fabricate Bismuth Telluride (Bi2Te3) thin-films by varying the various process parameters using a radio-frequency (RF) magnetron sputtering di...