Vandium dioxide active plasmonics

The insulator-metal transition (IMT) property of vanadium dioxide provides a large, abrupt change in refractive index, making it a good candidate active material for optical modulators. We show, in this paper, that plasmonic modulators can leverage the high modulation contrast of vanadium dioxide, w...

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Main Authors: Ooi, Kelvin J. A., Bai, Ping, Chu, Hong Son, Ang, Ricky Lay Kee
Other Authors: School of Electrical and Electronic Engineering
Format: Conference or Workshop Item
Language:English
Published: 2013
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Online Access:https://hdl.handle.net/10356/98101
http://hdl.handle.net/10220/12192
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Institution: Nanyang Technological University
Language: English
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spelling sg-ntu-dr.10356-981012020-03-07T13:24:48Z Vandium dioxide active plasmonics Ooi, Kelvin J. A. Bai, Ping Chu, Hong Son Ang, Ricky Lay Kee School of Electrical and Electronic Engineering Photonics Global Conference (2012 : Singapore) DRNTU::Engineering::Electrical and electronic engineering The insulator-metal transition (IMT) property of vanadium dioxide provides a large, abrupt change in refractive index, making it a good candidate active material for optical modulators. We show, in this paper, that plasmonic modulators can leverage the high modulation contrast of vanadium dioxide, while at the same time solve the problems of high insertion loss and high phase-transition electric-field threshold faced by vanadium dioxide photonic modulators. Our simulation results show that vanadium dioxide plasmonic slot and hybrid-slot waveguide modulators can achieve extinction ratios in excess of 10dB/μm with insertion losses as low as 2dB/μm. We also show that vanadium dioxide can be used to build plasmonic ring modulators. These high performance modulators are foundations to realizing plasmonic nanocircuits for next-generation chip technology. 2013-07-25T04:03:54Z 2019-12-06T19:50:32Z 2013-07-25T04:03:54Z 2019-12-06T19:50:32Z 2012 2012 Conference Paper Ooi, K. J. A., Bai, P., Chu, H. S., & Ang, L. K. R. (2012). Vandium dioxide active plasmonics. 2012 Photonics Global Conference (PGC). https://hdl.handle.net/10356/98101 http://hdl.handle.net/10220/12192 10.1109/PGC.2012.6457923 en © 2012 IEEE.
institution Nanyang Technological University
building NTU Library
country Singapore
collection DR-NTU
language English
topic DRNTU::Engineering::Electrical and electronic engineering
spellingShingle DRNTU::Engineering::Electrical and electronic engineering
Ooi, Kelvin J. A.
Bai, Ping
Chu, Hong Son
Ang, Ricky Lay Kee
Vandium dioxide active plasmonics
description The insulator-metal transition (IMT) property of vanadium dioxide provides a large, abrupt change in refractive index, making it a good candidate active material for optical modulators. We show, in this paper, that plasmonic modulators can leverage the high modulation contrast of vanadium dioxide, while at the same time solve the problems of high insertion loss and high phase-transition electric-field threshold faced by vanadium dioxide photonic modulators. Our simulation results show that vanadium dioxide plasmonic slot and hybrid-slot waveguide modulators can achieve extinction ratios in excess of 10dB/μm with insertion losses as low as 2dB/μm. We also show that vanadium dioxide can be used to build plasmonic ring modulators. These high performance modulators are foundations to realizing plasmonic nanocircuits for next-generation chip technology.
author2 School of Electrical and Electronic Engineering
author_facet School of Electrical and Electronic Engineering
Ooi, Kelvin J. A.
Bai, Ping
Chu, Hong Son
Ang, Ricky Lay Kee
format Conference or Workshop Item
author Ooi, Kelvin J. A.
Bai, Ping
Chu, Hong Son
Ang, Ricky Lay Kee
author_sort Ooi, Kelvin J. A.
title Vandium dioxide active plasmonics
title_short Vandium dioxide active plasmonics
title_full Vandium dioxide active plasmonics
title_fullStr Vandium dioxide active plasmonics
title_full_unstemmed Vandium dioxide active plasmonics
title_sort vandium dioxide active plasmonics
publishDate 2013
url https://hdl.handle.net/10356/98101
http://hdl.handle.net/10220/12192
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