Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films
Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a...
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sg-ntu-dr.10356-991962023-07-14T15:50:13Z Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films Motapothula, M. Guo, Rui You, Lu Zhang, Zhen Chen, Lang Wu, Di Wang, Junling Breese, Mark B. H. School of Materials Science & Engineering Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a combination of interface effect and defect induced internal field causes this evolution. Published version 2013-06-10T03:12:20Z 2019-12-06T20:04:25Z 2013-06-10T03:12:20Z 2019-12-06T20:04:25Z 2012 2012 Journal Article Guo, R., You, L., Motapothula, M., Zhang, Z., Breese, M. B. H., Chen, L., et al. (2012). Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films. AIP Advances, 2(4), 042104-. https://hdl.handle.net/10356/99196 http://hdl.handle.net/10220/10093 10.1063/1.4757938 en AIP advances © 2012 The Authors. This paper was published in AIP Advances and is made available as an electronic reprint (preprint) with permission of the authors. The paper can be found at the following official DOI: [http://dx.doi.org/10.1063/1.4757938]. One print or electronic copy may be made for personal use only. Systematic or multiple reproduction, distribution to multiple locations via electronic or other means, duplication of any material in this paper for a fee or for commercial purposes, or modification of the content of the paper is prohibited and is subject to penalties under law. application/pdf |
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Domain structure of BiFeO3 thin films can be controlled by adjusting the target composition or the substrate temperature during pulsed laser deposition. Decreasing Bi content in the target or increasing substrate temperature changes the domain structure of BiFeO3 from 71° to 109°. We suggest that a combination of interface effect and defect induced internal field causes this evolution. |
| author2 |
School of Materials Science & Engineering |
| author_facet |
School of Materials Science & Engineering Motapothula, M. Guo, Rui You, Lu Zhang, Zhen Chen, Lang Wu, Di Wang, Junling Breese, Mark B. H. |
| format |
Article |
| author |
Motapothula, M. Guo, Rui You, Lu Zhang, Zhen Chen, Lang Wu, Di Wang, Junling Breese, Mark B. H. |
| spellingShingle |
Motapothula, M. Guo, Rui You, Lu Zhang, Zhen Chen, Lang Wu, Di Wang, Junling Breese, Mark B. H. Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| author_sort |
Motapothula, M. |
| title |
Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| title_short |
Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| title_full |
Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| title_fullStr |
Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| title_full_unstemmed |
Influence of target composition and deposition temperature on the domain structure of BiFeO3 thin films |
| title_sort |
influence of target composition and deposition temperature on the domain structure of bifeo3 thin films |
| publishDate |
2013 |
| url |
https://hdl.handle.net/10356/99196 http://hdl.handle.net/10220/10093 |
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1772828250170458112 |