Large contrast enhancement by sonication assisted cold development process for low dose and ultrahigh resolution patterning on ZEP520A positive tone resist

• المؤلفون الرئيسيون: Tobing, Landobasa Yosef Mario A. L., Tjahjana, Liliana, Zhang, Dao Hua
• مؤلفون آخرون: School of Electrical and Electronic Engineering
• التنسيق: مقال
• اللغة: English
• منشور في: 2013
• الموضوعات: DRNTU::Engineering::Electrical and electronic engineering::Microelectronics
• الوصول للمادة أونلاين: https://hdl.handle.net/10356/99454; http://hdl.handle.net/10220/17831

The authors demonstrate a robust, low dose, high contrast, and ultrahigh resolution patterning process based on sonication assisted development of ZEP520A positive tone resist in both room and cold temperature. The contrast as high as γ ∼ 25 and γ ∼ 9.14 can readily be achieved in 6 °C and room temp...