The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications
We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key resu...
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| Main Authors: | , , |
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| Other Authors: | |
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2013
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| Online Access: | https://hdl.handle.net/10356/97976 http://hdl.handle.net/10220/12195 |
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| Institution: | Nanyang Technological University |
| Language: | English |