The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications
We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key resu...
Saved in:
| Main Authors: | , , |
|---|---|
| Other Authors: | |
| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
2013
|
| Online Access: | https://hdl.handle.net/10356/97976 http://hdl.handle.net/10220/12195 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
| Institution: | Nanyang Technological University |
| Language: | English |
| Summary: | We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key results include sub-15-nm gold nanodots at 40-nm pitch and high density optical metamaterial (with only ~30nm separation between two adjacent resonators). |
|---|