The role of cold sonicated development scenarios for achieving ultradense and high aspect ratio for optical metamaterial applications

• Main Authors: Tjahjana, Liliana, Zhang, Dao Hua, Tobing, Landobasa Yosef Mario A. L.
• Other Authors: School of Electrical and Electronic Engineering
• Format: Conference or Workshop Item
• Language: English
• Published: 2013
• Online Access: https://hdl.handle.net/10356/97976; http://hdl.handle.net/10220/12195
• Institution: Nanyang Technological University

We present a systematic study of different sonicated cold development scenarios for the purpose of achieving high density optical metamaterial. High aspect ratio sub-15-nm dots at pitch as small as 40 nm are successfully demonstrated for 110-nm thick resist at low exposure dose. Some of the key resu...