Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates
10.1016/j.electacta.2005.05.051
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sg-nus-scholar.10635-1069772024-11-14T08:19:47Z Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates Huang, Y.Z. Blackwood, D.J. MATERIALS SCIENCE Anodic oxide film growth EIS and XPS Sweep rate Titanium 10.1016/j.electacta.2005.05.051 Electrochimica Acta 51 6 1099-1107 ELCAA 2014-10-29T08:37:45Z 2014-10-29T08:37:45Z 2005-11-25 Article Huang, Y.Z., Blackwood, D.J. (2005-11-25). Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates. Electrochimica Acta 51 (6) : 1099-1107. ScholarBank@NUS Repository. https://doi.org/10.1016/j.electacta.2005.05.051 00134686 http://scholarbank.nus.edu.sg/handle/10635/106977 000234032800009 Scopus |
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Anodic oxide film growth EIS and XPS Sweep rate Titanium |
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Anodic oxide film growth EIS and XPS Sweep rate Titanium Huang, Y.Z. Blackwood, D.J. Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
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10.1016/j.electacta.2005.05.051 |
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MATERIALS SCIENCE |
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MATERIALS SCIENCE Huang, Y.Z. Blackwood, D.J. |
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Article |
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Huang, Y.Z. Blackwood, D.J. |
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Huang, Y.Z. |
title |
Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
title_short |
Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
title_full |
Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
title_fullStr |
Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
title_full_unstemmed |
Characterisation of titanium oxide film grown in 0.9% NaCl at different sweep rates |
title_sort |
characterisation of titanium oxide film grown in 0.9% nacl at different sweep rates |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/106977 |
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