High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD

Advanced Materials

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Main Authors: Wang, Y., Gong, H.
Other Authors: MATERIALS SCIENCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/107063
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1070632015-02-03T18:47:46Z High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD Wang, Y. Gong, H. MATERIALS SCIENCE Advanced Materials 12 22 285-288 ADVME 2014-10-29T08:38:58Z 2014-10-29T08:38:58Z 2000-11 Article Wang, Y.,Gong, H. (2000-11). High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD. Advanced Materials 12 (22) : 285-288. ScholarBank@NUS Repository. 09359648 http://scholarbank.nus.edu.sg/handle/10635/107063 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Advanced Materials
author2 MATERIALS SCIENCE
author_facet MATERIALS SCIENCE
Wang, Y.
Gong, H.
format Article
author Wang, Y.
Gong, H.
spellingShingle Wang, Y.
Gong, H.
High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
author_sort Wang, Y.
title High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
title_short High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
title_full High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
title_fullStr High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
title_full_unstemmed High-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced MOCVD
title_sort high-conductivity p-type transparent copper aluminum oxide film prepared by plasma-enhanced mocvd
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/107063
_version_ 1681093576934555648