Pey, K., Tung, C., Tang, L., Ranjan, R., Radhakrishnan, M., Lin, W., . . . MICROELECTRONICS, I. O. (2014). Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy.
Chicago Style CitationPey, K.L., C.H Tung, L.J Tang, R. Ranjan, M.K Radhakrishnan, W.H Lin, S. Lombardo, F. Palumbo, and INSTITUTE OF MICROELECTRONICS. Structural Analysis of Breakdown in Ultrathin Gate Dielectrics Using Transmission Electron Microscopy. 2014.
MLA引文Pey, K.L., et al. Structural Analysis of Breakdown in Ultrathin Gate Dielectrics Using Transmission Electron Microscopy. 2014.
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