Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering

10.1088/0268-1242/22/11/009

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Main Authors: Wong, T.K.S., Gong, Y., Yang, P., Ng, C.M.
Other Authors: SINGAPORE SYNCHROTRON LIGHT SOURCE
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/116946
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1169462024-11-13T08:37:38Z Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering Wong, T.K.S. Gong, Y. Yang, P. Ng, C.M. SINGAPORE SYNCHROTRON LIGHT SOURCE 10.1088/0268-1242/22/11/009 Semiconductor Science and Technology 22 11 1232-1239 SSTEE 2014-12-12T07:59:32Z 2014-12-12T07:59:32Z 2007-11-01 Article Wong, T.K.S., Gong, Y., Yang, P., Ng, C.M. (2007-11-01). Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering. Semiconductor Science and Technology 22 (11) : 1232-1239. ScholarBank@NUS Repository. https://doi.org/10.1088/0268-1242/22/11/009 02681242 http://scholarbank.nus.edu.sg/handle/10635/116946 000250727700009 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description 10.1088/0268-1242/22/11/009
author2 SINGAPORE SYNCHROTRON LIGHT SOURCE
author_facet SINGAPORE SYNCHROTRON LIGHT SOURCE
Wong, T.K.S.
Gong, Y.
Yang, P.
Ng, C.M.
format Article
author Wong, T.K.S.
Gong, Y.
Yang, P.
Ng, C.M.
spellingShingle Wong, T.K.S.
Gong, Y.
Yang, P.
Ng, C.M.
Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
author_sort Wong, T.K.S.
title Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
title_short Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
title_full Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
title_fullStr Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
title_full_unstemmed Characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
title_sort characterization of biaxial stressed silicon by spectroscopic ellipsometry and synchrotron x-ray scattering
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/116946
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