KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY
Master's
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2019
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sg-nus-scholar.10635-1541302019-05-15T13:14:44Z KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY TEH CHOONG LONG SINGAPORE-MIT ALLIANCE JEFFREY SU YONG JIE High Q Inductor Stress-Compensating Strategy Process Development Thick Low-k Dielectric Deep Trench Etching Master's MASTER OF SCIENCE 2019-05-15T04:18:28Z 2019-05-15T04:18:28Z 2003 Thesis TEH CHOONG LONG (2003). KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/154130 SMA BATCHLOAD 20190422 |
institution |
National University of Singapore |
building |
NUS Library |
country |
Singapore |
collection |
ScholarBank@NUS |
topic |
High Q Inductor Stress-Compensating Strategy Process Development Thick Low-k Dielectric Deep Trench Etching |
spellingShingle |
High Q Inductor Stress-Compensating Strategy Process Development Thick Low-k Dielectric Deep Trench Etching TEH CHOONG LONG KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
description |
Master's |
author2 |
SINGAPORE-MIT ALLIANCE |
author_facet |
SINGAPORE-MIT ALLIANCE TEH CHOONG LONG |
format |
Theses and Dissertations |
author |
TEH CHOONG LONG |
author_sort |
TEH CHOONG LONG |
title |
KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
title_short |
KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
title_full |
KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
title_fullStr |
KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
title_full_unstemmed |
KEY FACTORS STUDY OF HIGH Q INDUCTOR FABRICATED BY CMOS TECHNOLOGY |
title_sort |
key factors study of high q inductor fabricated by cmos technology |
publishDate |
2019 |
url |
https://scholarbank.nus.edu.sg/handle/10635/154130 |
_version_ |
1681099341868040192 |