A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE

Master's

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Bibliographic Details
Main Author:	XU ZHEN
Other Authors:	ELECTRICAL AND COMPUTER ENGINEERING
Format:	Theses and Dissertations
Published:	2019
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/158710
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-158710
record_format	dspace
spelling	sg-nus-scholar.10635-1587102024-10-26T00:58:50Z A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE XU ZHEN ELECTRICAL AND COMPUTER ENGINEERING BYUNG JIN CHO MING FU LI Master's MASTER OF ENGINEERING 2019-09-16T02:35:43Z 2019-09-16T02:35:43Z 2001 Thesis XU ZHEN (2001). A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/158710 CCK BATCHLOAD 20190911
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Master's
author2	ELECTRICAL AND COMPUTER ENGINEERING
author_facet	ELECTRICAL AND COMPUTER ENGINEERING XU ZHEN
format	Theses and Dissertations
author	XU ZHEN
spellingShingle	XU ZHEN A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
author_sort	XU ZHEN
title	A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
title_short	A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
title_full	A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
title_fullStr	A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
title_full_unstemmed	A STUDY OF THE QUASI-BREAKDOWN MECHANISM IN ULTRA-THIN GATE OXIDE
title_sort	study of the quasi-breakdown mechanism in ultra-thin gate oxide
publishDate	2019
url	https://scholarbank.nus.edu.sg/handle/10635/158710
_version_	1821225436272656384

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