SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING

Master's

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Bibliographic Details
Main Author: LOW CHUN HUI
Other Authors: CHEMISTRY
Format: Theses and Dissertations
Published: 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/158743
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Institution: National University of Singapore
id sg-nus-scholar.10635-158743
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spelling sg-nus-scholar.10635-1587432024-04-17T06:15:09Z SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING LOW CHUN HUI CHEMISTRY CHIN WEE SHONG Master's MASTER OF SCIENCE 2019-09-16T02:36:59Z 2019-09-16T02:36:59Z 1999 Thesis LOW CHUN HUI (1999). SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/158743 CCK BATCHLOAD 20190911
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Master's
author2 CHEMISTRY
author_facet CHEMISTRY
LOW CHUN HUI
format Theses and Dissertations
author LOW CHUN HUI
spellingShingle LOW CHUN HUI
SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
author_sort LOW CHUN HUI
title SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_short SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_full SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_fullStr SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_full_unstemmed SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_sort spectroscopic studies of high density plasma etching processes for ic manufacturing
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/158743
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