Selective EPI process for advanced CMOS devices

Master's

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Bibliographic Details
Main Author:	CHOI KYU JIN
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	SiGe, SiC, SiGeC, Epitaxy, Critical thickness, Substitutional carbon
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/15977
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-15977
record_format	dspace
spelling	sg-nus-scholar.10635-159772015-01-12T08:53:06Z Selective EPI process for advanced CMOS devices CHOI KYU JIN ELECTRICAL & COMPUTER ENGINEERING CHO BYUNG-JIN SiGe, SiC, SiGeC, Epitaxy, Critical thickness, Substitutional carbon Master's MASTER OF ENGINEERING 2010-04-08T10:59:33Z 2010-04-08T10:59:33Z 2008-11-17 Thesis CHOI KYU JIN (2008-11-17). Selective EPI process for advanced CMOS devices. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15977 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	SiGe, SiC, SiGeC, Epitaxy, Critical thickness, Substitutional carbon
spellingShingle	SiGe, SiC, SiGeC, Epitaxy, Critical thickness, Substitutional carbon CHOI KYU JIN Selective EPI process for advanced CMOS devices
description	Master's
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING CHOI KYU JIN
format	Theses and Dissertations
author	CHOI KYU JIN
author_sort	CHOI KYU JIN
title	Selective EPI process for advanced CMOS devices
title_short	Selective EPI process for advanced CMOS devices
title_full	Selective EPI process for advanced CMOS devices
title_fullStr	Selective EPI process for advanced CMOS devices
title_full_unstemmed	Selective EPI process for advanced CMOS devices
title_sort	selective epi process for advanced cmos devices
publishDate	2010
url	http://scholarbank.nus.edu.sg/handle/10635/15977
_version_	1681079285289320448

Selective EPI process for advanced CMOS devices

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