Control and signal processing for lithography
Ph.D
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2010
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sg-nus-scholar.10635-159882015-01-06T09:32:59Z Control and signal processing for lithography CHEN MING ELECTRICAL & COMPUTER ENGINEERING HO WENG KHUEN TAY EE BENG, ARTHUR Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:59:39Z 2010-04-08T10:59:39Z 2008-09-26 Thesis CHEN MING (2008-09-26). Control and signal processing for lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15988 NOT_IN_WOS en |
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National University of Singapore |
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Singapore |
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ScholarBank@NUS |
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English |
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Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control |
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Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control CHEN MING Control and signal processing for lithography |
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Ph.D |
author2 |
ELECTRICAL & COMPUTER ENGINEERING |
author_facet |
ELECTRICAL & COMPUTER ENGINEERING CHEN MING |
format |
Theses and Dissertations |
author |
CHEN MING |
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CHEN MING |
title |
Control and signal processing for lithography |
title_short |
Control and signal processing for lithography |
title_full |
Control and signal processing for lithography |
title_fullStr |
Control and signal processing for lithography |
title_full_unstemmed |
Control and signal processing for lithography |
title_sort |
control and signal processing for lithography |
publishDate |
2010 |
url |
http://scholarbank.nus.edu.sg/handle/10635/15988 |
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1681079287137959936 |