Control and signal processing for lithography

Ph.D

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Bibliographic Details
Main Author: CHEN MING
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Theses and Dissertations
Language:English
Published: 2010
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/15988
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Institution: National University of Singapore
Language: English
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spelling sg-nus-scholar.10635-159882015-01-06T09:32:59Z Control and signal processing for lithography CHEN MING ELECTRICAL & COMPUTER ENGINEERING HO WENG KHUEN TAY EE BENG, ARTHUR Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control Ph.D DOCTOR OF PHILOSOPHY 2010-04-08T10:59:39Z 2010-04-08T10:59:39Z 2008-09-26 Thesis CHEN MING (2008-09-26). Control and signal processing for lithography. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/15988 NOT_IN_WOS en
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
language English
topic Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control
spellingShingle Lithography, Critical Dimension, wafer warpage, real-time control, resist thickness, optimal feed-forward control
CHEN MING
Control and signal processing for lithography
description Ph.D
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
CHEN MING
format Theses and Dissertations
author CHEN MING
author_sort CHEN MING
title Control and signal processing for lithography
title_short Control and signal processing for lithography
title_full Control and signal processing for lithography
title_fullStr Control and signal processing for lithography
title_full_unstemmed Control and signal processing for lithography
title_sort control and signal processing for lithography
publishDate 2010
url http://scholarbank.nus.edu.sg/handle/10635/15988
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