SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING

Master's

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Bibliographic Details
Main Author: LOW CHUN HUI
Other Authors: DEPT OF CHEMISTRY
Format: Theses and Dissertations
Published: 2019
Online Access:https://scholarbank.nus.edu.sg/handle/10635/160057
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1600572019-10-18T05:45:44Z SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING LOW CHUN HUI DEPT OF CHEMISTRY CHIN WEE SHONG Master's MASTER OF SCIENCE 2019-10-18T05:45:44Z 2019-10-18T05:45:44Z 1999 Thesis LOW CHUN HUI (1999). SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/160057 CCK BATCHLOAD 20190911
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Master's
author2 DEPT OF CHEMISTRY
author_facet DEPT OF CHEMISTRY
LOW CHUN HUI
format Theses and Dissertations
author LOW CHUN HUI
spellingShingle LOW CHUN HUI
SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
author_sort LOW CHUN HUI
title SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_short SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_full SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_fullStr SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_full_unstemmed SPECTROSCOPIC STUDIES OF HIGH DENSITY PLASMA ETCHING PROCESSES FOR IC MANUFACTURING
title_sort spectroscopic studies of high density plasma etching processes for ic manufacturing
publishDate 2019
url https://scholarbank.nus.edu.sg/handle/10635/160057
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