The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography

Master's

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Bibliographic Details
Main Author:	TAN SOON YOENG
Other Authors:	MECHANICAL ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2010
Subjects:	Chromeless Phase Lithography, Mask Error Enhancement Factor, Phase, Zebra, Transverse-magnetic, Transverse-electric
Online Access:	https://scholarbank.nus.edu.sg/handle/10635/16614
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-16614
record_format	dspace
spelling	sg-nus-scholar.10635-166142020-11-18T02:58:32Z The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography TAN SOON YOENG MECHANICAL ENGINEERING TAY CHO JUI QUAN CHENGGEN Chromeless Phase Lithography, Mask Error Enhancement Factor, Phase, Zebra, Transverse-magnetic, Transverse-electric Master's MASTER OF ENGINEERING 2010-04-08T11:07:04Z 2010-04-08T11:07:04Z 2008-12-12 Thesis TAN SOON YOENG (2008-12-12). The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/16614 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
language	English
topic	Chromeless Phase Lithography, Mask Error Enhancement Factor, Phase, Zebra, Transverse-magnetic, Transverse-electric
spellingShingle	Chromeless Phase Lithography, Mask Error Enhancement Factor, Phase, Zebra, Transverse-magnetic, Transverse-electric TAN SOON YOENG The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
description	Master's
author2	MECHANICAL ENGINEERING
author_facet	MECHANICAL ENGINEERING TAN SOON YOENG
format	Theses and Dissertations
author	TAN SOON YOENG
author_sort	TAN SOON YOENG
title	The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
title_short	The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
title_full	The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
title_fullStr	The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
title_full_unstemmed	The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography
title_sort	characterization of chromeless phase shift mask technique for sub-45nm lithography
publishDate	2010
url	https://scholarbank.nus.edu.sg/handle/10635/16614
_version_	1684664562727518208

The Characterization of Chromeless Phase Shift Mask Technique for Sub-45nm Lithography

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