Interface engineering for the enhancement of carrier transport in black phosphorus transistor with ultra-thin high-? gate dielectric
10.1038/srep26609
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Main Authors: | , , , |
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Other Authors: | |
Format: | Article |
Published: |
Nature Publishing Group
2020
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Online Access: | https://scholarbank.nus.edu.sg/handle/10635/174959 |
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Institution: | National University of Singapore |