EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS

Master's

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Bibliographic Details
Main Author: CHOO CHONG KHENG
Other Authors: ELECTRICAL ENGINEERING
Format: Theses and Dissertations
Published: 2020
Online Access:https://scholarbank.nus.edu.sg/handle/10635/177891
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Institution: National University of Singapore
id sg-nus-scholar.10635-177891
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spelling sg-nus-scholar.10635-1778912020-11-19T13:57:16Z EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS CHOO CHONG KHENG ELECTRICAL ENGINEERING CHOI WEE KIONG LU YONG FENG Master's MASTER OF ENGINEERING 2020-10-20T03:53:34Z 2020-10-20T03:53:34Z 1997 Thesis CHOO CHONG KHENG (1997). EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS. ScholarBank@NUS Repository. https://scholarbank.nus.edu.sg/handle/10635/177891 CCK BATCHLOAD 20201023
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description Master's
author2 ELECTRICAL ENGINEERING
author_facet ELECTRICAL ENGINEERING
CHOO CHONG KHENG
format Theses and Dissertations
author CHOO CHONG KHENG
spellingShingle CHOO CHONG KHENG
EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
author_sort CHOO CHONG KHENG
title EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
title_short EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
title_full EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
title_fullStr EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
title_full_unstemmed EFFECT OF RAPID THERMAL ANNEALING ON RF SPUTTERED SILICON-SILICON OXIDE SYSTEMS
title_sort effect of rapid thermal annealing on rf sputtered silicon-silicon oxide systems
publishDate 2020
url https://scholarbank.nus.edu.sg/handle/10635/177891
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