Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage
10.1002/advs.201500405
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sg-nus-scholar.10635-1833142024-04-25T01:03:15Z Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage Guan, C Wang, J MATERIALS SCIENCE AND ENGINEERING Atoms Chemical vapor deposition Deposition Electrochemical electrodes Electrodes Energy storage Films Nanostructures Storage (materials) Surface chemistry Surface treatment Vapor deposition Advanced electrodes Chemical vapor depositions (CVD) Deposition thickness Electrochemical energy storage Electrochemical energy storage devices Electrode material Interfacial features Processing technique Atomic layer deposition 10.1002/advs.201500405 Advanced Science 3 10 1500405 2020-11-10T07:53:06Z 2020-11-10T07:53:06Z 2016 Review Guan, C, Wang, J (2016). Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage. Advanced Science 3 (10) : 1500405. ScholarBank@NUS Repository. https://doi.org/10.1002/advs.201500405 21983844 https://scholarbank.nus.edu.sg/handle/10635/183314 Attribution 4.0 International http://creativecommons.org/licenses/by/4.0/ Unpaywall 20201031 |
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Atoms Chemical vapor deposition Deposition Electrochemical electrodes Electrodes Energy storage Films Nanostructures Storage (materials) Surface chemistry Surface treatment Vapor deposition Advanced electrodes Chemical vapor depositions (CVD) Deposition thickness Electrochemical energy storage Electrochemical energy storage devices Electrode material Interfacial features Processing technique Atomic layer deposition |
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Atoms Chemical vapor deposition Deposition Electrochemical electrodes Electrodes Energy storage Films Nanostructures Storage (materials) Surface chemistry Surface treatment Vapor deposition Advanced electrodes Chemical vapor depositions (CVD) Deposition thickness Electrochemical energy storage Electrochemical energy storage devices Electrode material Interfacial features Processing technique Atomic layer deposition Guan, C Wang, J Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
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10.1002/advs.201500405 |
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MATERIALS SCIENCE AND ENGINEERING |
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MATERIALS SCIENCE AND ENGINEERING Guan, C Wang, J |
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Review |
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Guan, C Wang, J |
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Guan, C |
title |
Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
title_short |
Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
title_full |
Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
title_fullStr |
Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
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Recent Development of Advanced Electrode Materials by Atomic Layer Deposition for Electrochemical Energy Storage |
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recent development of advanced electrode materials by atomic layer deposition for electrochemical energy storage |
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2020 |
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https://scholarbank.nus.edu.sg/handle/10635/183314 |
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