Zitterbewegung-mediated RKKY coupling in topological insulator thin films

10.1088/1367-2630/ab95df

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Bibliographic Details
Main Authors: Ho, C.S., Tan, S.G., Siu, Zhuo Bin, Jalil, M.B.A.
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: Institute of Physics Publishing 2021
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/197684
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Institution: National University of Singapore