Work function and process integration issues of metal gate materials in CMOS technology

Ph.D

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Bibliographic Details
Main Author:	REN CHI
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2011
Subjects:	CMOS, Metal Gate Electrode, Work Function, Integration, Thermal Stability, Lanthanide-incorporated Metal Nitride
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/23136
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-23136
record_format	dspace
spelling	sg-nus-scholar.10635-231362017-10-21T08:57:51Z Work function and process integration issues of metal gate materials in CMOS technology REN CHI ELECTRICAL & COMPUTER ENGINEERING CHAN SIU HUNG, DANIEL CMOS, Metal Gate Electrode, Work Function, Integration, Thermal Stability, Lanthanide-incorporated Metal Nitride Ph.D DOCTOR OF PHILOSOPHY 2011-06-10T18:02:52Z 2011-06-10T18:02:52Z 2007-04-30 Thesis REN CHI (2007-04-30). Work function and process integration issues of metal gate materials in CMOS technology. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/23136 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	CMOS, Metal Gate Electrode, Work Function, Integration, Thermal Stability, Lanthanide-incorporated Metal Nitride
spellingShingle	CMOS, Metal Gate Electrode, Work Function, Integration, Thermal Stability, Lanthanide-incorporated Metal Nitride REN CHI Work function and process integration issues of metal gate materials in CMOS technology
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING REN CHI
format	Theses and Dissertations
author	REN CHI
author_sort	REN CHI
title	Work function and process integration issues of metal gate materials in CMOS technology
title_short	Work function and process integration issues of metal gate materials in CMOS technology
title_full	Work function and process integration issues of metal gate materials in CMOS technology
title_fullStr	Work function and process integration issues of metal gate materials in CMOS technology
title_full_unstemmed	Work function and process integration issues of metal gate materials in CMOS technology
title_sort	work function and process integration issues of metal gate materials in cmos technology
publishDate	2011
url	http://scholarbank.nus.edu.sg/handle/10635/23136
_version_	1681080016962584576

Work function and process integration issues of metal gate materials in CMOS technology

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