Highly-Entangled Polyradical Nanographene with Coexisting Strong Correlation and Topological Frustration

Highly-Entangled Polyradical Nanographene with Coexisting Strong Correlation and Topological Frustration

Nat. Chem.

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Bibliographic Details
Main Authors: S. Song, A. P. Solé, A. Matěj, G. Li, O. Stetsovych, D. Soler, H. Yang, M. Telychko, J. Li, M. Kumar, J. Brabec, L. Veis, J. Wu, P. Jelinek, J. Lu
Other Authors: CHEMISTRY
Format: Article
Published: Nature Publishing Group 2024
Online Access:https://scholarbank.nus.edu.sg/handle/10635/248013
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Institution: National University of Singapore

Internet

https://scholarbank.nus.edu.sg/handle/10635/248013

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