Real-time monitoring and control of critical dimensions in Lithography.

Ph.D

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Bibliographic Details
Main Author:	YANG GENG
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Theses and Dissertations
Language:	English
Published:	2013
Subjects:	lithography, critical dimension, uniformity, real-time control, bake-plate, ellipsometry
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/48661
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Institution:	National University of Singapore
Language:	English

id	sg-nus-scholar.10635-48661
record_format	dspace
spelling	sg-nus-scholar.10635-486612015-01-21T20:44:05Z Real-time monitoring and control of critical dimensions in Lithography. YANG GENG ELECTRICAL & COMPUTER ENGINEERING TAY EE BENG, ARTHUR HO WENG KHUEN lithography, critical dimension, uniformity, real-time control, bake-plate, ellipsometry Ph.D DOCTOR OF PHILOSOPHY 2013-12-31T18:31:13Z 2013-12-31T18:31:13Z 2012-12-27 Thesis YANG GENG (2012-12-27). Real-time monitoring and control of critical dimensions in Lithography.. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/48661 NOT_IN_WOS en
institution	National University of Singapore
building	NUS Library
country	Singapore
collection	ScholarBank@NUS
language	English
topic	lithography, critical dimension, uniformity, real-time control, bake-plate, ellipsometry
spellingShingle	lithography, critical dimension, uniformity, real-time control, bake-plate, ellipsometry YANG GENG Real-time monitoring and control of critical dimensions in Lithography.
description	Ph.D
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING YANG GENG
format	Theses and Dissertations
author	YANG GENG
author_sort	YANG GENG
title	Real-time monitoring and control of critical dimensions in Lithography.
title_short	Real-time monitoring and control of critical dimensions in Lithography.
title_full	Real-time monitoring and control of critical dimensions in Lithography.
title_fullStr	Real-time monitoring and control of critical dimensions in Lithography.
title_full_unstemmed	Real-time monitoring and control of critical dimensions in Lithography.
title_sort	real-time monitoring and control of critical dimensions in lithography.
publishDate	2013
url	http://scholarbank.nus.edu.sg/handle/10635/48661
_version_	1681083510986637312

Real-time monitoring and control of critical dimensions in Lithography.

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