High- k gate stack on germanium substrate with fluorine incorporation
10.1063/1.2913048
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sg-nus-scholar.10635-561872023-10-26T07:01:08Z High- k gate stack on germanium substrate with fluorine incorporation Xie, R. Yu, M. Lai, M.Y. Chan, L. Zhu, C. ELECTRICAL & COMPUTER ENGINEERING 10.1063/1.2913048 Applied Physics Letters 92 16 - APPLA 2014-06-17T02:51:43Z 2014-06-17T02:51:43Z 2008 Article Xie, R., Yu, M., Lai, M.Y., Chan, L., Zhu, C. (2008). High- k gate stack on germanium substrate with fluorine incorporation. Applied Physics Letters 92 (16) : -. ScholarBank@NUS Repository. https://doi.org/10.1063/1.2913048 00036951 http://scholarbank.nus.edu.sg/handle/10635/56187 000255456100078 Scopus |
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National University of Singapore |
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NUS Library |
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Asia |
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Singapore Singapore |
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NUS Library |
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ScholarBank@NUS |
| description |
10.1063/1.2913048 |
| author2 |
ELECTRICAL & COMPUTER ENGINEERING |
| author_facet |
ELECTRICAL & COMPUTER ENGINEERING Xie, R. Yu, M. Lai, M.Y. Chan, L. Zhu, C. |
| format |
Article |
| author |
Xie, R. Yu, M. Lai, M.Y. Chan, L. Zhu, C. |
| spellingShingle |
Xie, R. Yu, M. Lai, M.Y. Chan, L. Zhu, C. High- k gate stack on germanium substrate with fluorine incorporation |
| author_sort |
Xie, R. |
| title |
High- k gate stack on germanium substrate with fluorine incorporation |
| title_short |
High- k gate stack on germanium substrate with fluorine incorporation |
| title_full |
High- k gate stack on germanium substrate with fluorine incorporation |
| title_fullStr |
High- k gate stack on germanium substrate with fluorine incorporation |
| title_full_unstemmed |
High- k gate stack on germanium substrate with fluorine incorporation |
| title_sort |
high- k gate stack on germanium substrate with fluorine incorporation |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/56187 |
| _version_ |
1781781123942055936 |