Molecular-beam epitaxy growth and magnetic properties of BeTe with Cr doping

10.1063/1.2168434

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Bibliographic Details
Main Authors: Viloane, K., Sreenivasan, M.G., Teo, K.L., Liew, T., Chong, T.C.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/56689
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Institution: National University of Singapore