Cho, B., Kim, S., Ling, C., Joo, M., Yeo, I., & ENGINEERING, E. (2014). Comparison between leakage currents in thin gate oxides subjected to X-ray radiation and electrical stress degradation.
Chicago Style CitationCho, B.J., S.J Kim, C.H Ling, M.-S Joo, I.-S Yeo, and ELECTRICAL ENGINEERING. Comparison between Leakage Currents in Thin Gate Oxides Subjected to X-ray Radiation and Electrical Stress Degradation. 2014.
MLA引文Cho, B.J., et al. Comparison between Leakage Currents in Thin Gate Oxides Subjected to X-ray Radiation and Electrical Stress Degradation. 2014.
警告：這些引文格式不一定是100％准確.