Tailoring the magnetization reversal in antidot nanostructures using lithographically engineered inhomogeneities

Tailoring the magnetization reversal in antidot nanostructures using lithographically engineered inhomogeneities

10.1063/1.3537948

Saved in:
Bibliographic Details
Main Authors: Tripathy, D., Vavassori, P., Adeyeye, A.O.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/71937
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
Description
Summary:10.1063/1.3537948

Similar Items