APA Citation

Tan, S., Lin, Q., Quan, C., Tay, C., See, A., & PHYSICS. (2014). Mask error enhancement factor for sub 0.13μm lithography.

Chicago Style Citation

Tan, S.K., Q. Lin, C. Quan, C.J Tay, A. See, and PHYSICS. Mask Error Enhancement Factor for Sub 0.13μm Lithography. 2014.

MLA Citation

Tan, S.K., et al. Mask Error Enhancement Factor for Sub 0.13μm Lithography. 2014.

Warning: These citations may not always be 100% accurate.