APA引文

Tan, S., Lin, Q., Quan, C., Tay, C., See, A., & PHYSICS. (2014). Mask error enhancement factor for sub 0.13μm lithography.

Chicago Style Citation

Tan, S.K., Q. Lin, C. Quan, C.J Tay, A. See, and PHYSICS. Mask Error Enhancement Factor for Sub 0.13μm Lithography. 2014.

MLA引文

Tan, S.K., et al. Mask Error Enhancement Factor for Sub 0.13μm Lithography. 2014.