Chan, H., Srinivasan, M., Benistant, F., Mok, K., Chan, L., Jin, H., & ENGINEERING, C. &. B. (2014). Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature.

Chan, H.Y., M.P Srinivasan, F. Benistant, K.R Mok, L. Chan, H.M Jin, and CHEMICAL & BIOMOLECULAR ENGINEERING. Continuum Modeling of Post-implantation Damage and the Effective Plus Factor in Crystalline Silicon At Room Temperature. 2014.

Chan, H.Y., et al. Continuum Modeling of Post-implantation Damage and the Effective Plus Factor in Crystalline Silicon At Room Temperature. 2014.