Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature

10.1016/j.tsf.2005.09.167

Saved in:
書目詳細資料
Main Authors: Chan, H.Y., Srinivasan, M.P., Benistant, F., Mok, K.R., Chan, L., Jin, H.M.
其他作者: CHEMICAL & BIOMOLECULAR ENGINEERING
格式: Conference or Workshop Item
出版: 2014
主題:
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/74522
標簽: 添加標簽
沒有標簽, 成為第一個標記此記錄!
機構: National University of Singapore