Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature

10.1016/j.tsf.2005.09.167

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Bibliographic Details
Main Authors:	Chan, H.Y., Srinivasan, M.P., Benistant, F., Mok, K.R., Chan, L., Jin, H.M.
Other Authors:	CHEMICAL & BIOMOLECULAR ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Subjects:	Diffusion-limited kinetics Ostwald ripening Transient enhanced diffusion
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/74522
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-74522
record_format	dspace
spelling	sg-nus-scholar.10635-745222023-10-30T21:20:18Z Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature Chan, H.Y. Srinivasan, M.P. Benistant, F. Mok, K.R. Chan, L. Jin, H.M. CHEMICAL & BIOMOLECULAR ENGINEERING Diffusion-limited kinetics Ostwald ripening Transient enhanced diffusion 10.1016/j.tsf.2005.09.167 Thin Solid Films 504 1-2 269-273 THSFA 2014-06-19T06:13:23Z 2014-06-19T06:13:23Z 2006-05-10 Conference Paper Chan, H.Y., Srinivasan, M.P., Benistant, F., Mok, K.R., Chan, L., Jin, H.M. (2006-05-10). Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature. Thin Solid Films 504 (1-2) : 269-273. ScholarBank@NUS Repository. https://doi.org/10.1016/j.tsf.2005.09.167 00406090 http://scholarbank.nus.edu.sg/handle/10635/74522 000236486200064 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	Diffusion-limited kinetics Ostwald ripening Transient enhanced diffusion
spellingShingle	Diffusion-limited kinetics Ostwald ripening Transient enhanced diffusion Chan, H.Y. Srinivasan, M.P. Benistant, F. Mok, K.R. Chan, L. Jin, H.M. Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
description	10.1016/j.tsf.2005.09.167
author2	CHEMICAL & BIOMOLECULAR ENGINEERING
author_facet	CHEMICAL & BIOMOLECULAR ENGINEERING Chan, H.Y. Srinivasan, M.P. Benistant, F. Mok, K.R. Chan, L. Jin, H.M.
format	Conference or Workshop Item
author	Chan, H.Y. Srinivasan, M.P. Benistant, F. Mok, K.R. Chan, L. Jin, H.M.
author_sort	Chan, H.Y.
title	Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
title_short	Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
title_full	Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
title_fullStr	Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
title_full_unstemmed	Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
title_sort	continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/74522
_version_	1781783369660497920

Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature

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