發送短信 : Continuum modeling of post-implantation damage and the effective plus factor in crystalline silicon at room temperature

 _    _    __   __   ______     ______    ______  
| || | ||  \ \\/ // |      \\  /_   _//  /_____// 
| || | ||   \ ` //  |  --  //   -| ||-   `____ `  
| \\_/ ||    | ||   |  --  \\   _| ||_   /___//   
 \____//     |_||   |______//  /_____//  `__ `    
  `---`      `-`'   `------`   `-----`   /_//     
                                         `-`