Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing
10.1016/S0218-625X(01)00137-3
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sg-nus-scholar.10635-771112015-02-17T18:32:21Z Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing Huang, B.-R. Loh, K.P. Hsu, J.-F. Chang, M.-C. CHEMISTRY 10.1016/S0218-625X(01)00137-3 Surface Review and Letters 8 5 477-482 SRLEF 2014-06-23T05:51:02Z 2014-06-23T05:51:02Z 2001 Article Huang, B.-R.,Loh, K.P.,Hsu, J.-F.,Chang, M.-C. (2001). Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing. Surface Review and Letters 8 (5) : 477-482. ScholarBank@NUS Repository. <a href="https://doi.org/10.1016/S0218-625X(01)00137-3" target="_blank">https://doi.org/10.1016/S0218-625X(01)00137-3</a> 0218625X http://scholarbank.nus.edu.sg/handle/10635/77111 NOT_IN_WOS Scopus |
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National University of Singapore |
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Singapore |
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10.1016/S0218-625X(01)00137-3 |
| author2 |
CHEMISTRY |
| author_facet |
CHEMISTRY Huang, B.-R. Loh, K.P. Hsu, J.-F. Chang, M.-C. |
| format |
Article |
| author |
Huang, B.-R. Loh, K.P. Hsu, J.-F. Chang, M.-C. |
| spellingShingle |
Huang, B.-R. Loh, K.P. Hsu, J.-F. Chang, M.-C. Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| author_sort |
Huang, B.-R. |
| title |
Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| title_short |
Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| title_full |
Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| title_fullStr |
Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| title_full_unstemmed |
Surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| title_sort |
surface characteristics of thick, free-standing diamond film prepared by chemical etching and rapid thermal processing |
| publishDate |
2014 |
| url |
http://scholarbank.nus.edu.sg/handle/10635/77111 |
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1681088404790444032 |