Remashan, K., Chua, S., Ramam, A., Prakash, S., Liu, W., & ENGINEERING, E. (2014). Inductively coupled plasma etching of GaN using BCl3/Cl2 chemistry and photoluminescence studies of the etched samples.
استشهاد بنمط شيكاغوRemashan, K., S.J Chua, A. Ramam, S. Prakash, W. Liu, و ELECTRICAL ENGINEERING. Inductively Coupled Plasma Etching of GaN Using BCl3/Cl2 Chemistry and Photoluminescence Studies of the Etched Samples. 2014.
MLA استشهادRemashan, K., et al. Inductively Coupled Plasma Etching of GaN Using BCl3/Cl2 Chemistry and Photoluminescence Studies of the Etched Samples. 2014.
تحذير: قد لا تكون هذه الاستشهادات دائما دقيقة بنسبة 100%.