Inductively coupled plasma etching of GaN using BCl3/Cl2 chemistry and photoluminescence studies of the etched samples

Inductively coupled plasma etching of GaN using BCl3/Cl2 chemistry and photoluminescence studies of the etched samples

10.1088/0268-1242/15/4/313

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Bibliographic Details
Main Authors: Remashan, K., Chua, S.J., Ramam, A., Prakash, S., Liu, W.
Other Authors: ELECTRICAL ENGINEERING
Format: Article
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/80593
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Institution: National University of Singapore

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http://scholarbank.nus.edu.sg/handle/10635/80593

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