Inductively coupled plasma etching of GaN using BCl3/Cl2 chemistry and photoluminescence studies of the etched samples

10.1088/0268-1242/15/4/313

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書目詳細資料
Main Authors: Remashan, K., Chua, S.J., Ramam, A., Prakash, S., Liu, W.
其他作者: ELECTRICAL ENGINEERING
格式: Article
出版: 2014
在線閱讀:http://scholarbank.nus.edu.sg/handle/10635/80593
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機構: National University of Singapore